Annealing and firing

Annealing can be a key stage in producing any thin-film photovoltaic. It is often used to re-crystallize active layers, for example during the selenization of CIGS layers. Firing, another common application, is used to improve the electrical contact between layers such as microcrystalline silicon and a metal back contact.

We can supply high-volume in-line and stationary systems with integrated cooling and buffering capabilities. Temperatures can be in excess of 600 °C in these systems, and handling glass at these temperatures is a big challenge for many PV makers. But it’s one in which we have a strong track record stretching back many decades. Our high-throughput annealing solutions have multiple zones that can be heated to individual temperatures.

For some processes, fast heating and cooling may be required to avoid unwanted crystalline structures. Again that can be difficult when working with glass. However, through rapid thermal processing (RTP) and fast convective cooling, we can help you achieve reliable results in a high-volume production environment.

Defining and controlling the atmosphere is often a vital step of an anneal process, letting you encourage or prevent chemical reaction. With the experience gained from hundreds of controlled-atmosphere annealing solutions and our in-house fluid dynamics expertise, we can deliver the precise atmosphere control you need – from just clean air to inert gases.

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