Diffusion and semiconductor activation

High-temperature diffusion is a fast and effective way to uniformly incorporate materials such as dopants into existing layers. A similar technique is used to activate semiconductor layers, for example by heating CdTe in a chloride-containing atmosphere or incorporating sulfur into CIS precursors.

Both techniques are perfectly suited to continuous production processes, enabling higher throughputs, reduced handling and lower production costs. We offer highly controllable muffle-style furnaces for mass-production diffusion and semiconductor activation on large substrates. These usually include belt or roller transport systems.

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